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Application of UV, H2O2, H2O2/UV, Fe(II)/H2O2 and Fe(II)/H2O2/UV process for oxidation of organic compounds in printed circuit boards wastewater
Authors:
- Maciej Thomas,
- Krzysztof Barbusinski,
- Barbara Bialecka
Abstract
The paper deals with possible use of acidification and UV, H2O2, H2O2/UV, Fe(II)/H2O2 and Fe(II)/H2O2/UV (Fenton and Photo-Fenton) process for purifying contaminated printed circuit boards wastewater (pH=10.5, Chemical Oxygen Demand, COD=5 980 mg O2/L, Total Organic Carbon, TOC=2 100 mg/L). Application of acidification and Photo-Fenton process was allowed to decrease COD (98.5%) and TOC (98.1%) in treated wastewater.
- Record ID
- CUT8c55b48dc23f421fb79ae5bcb1061de8
- Publication categories
- ; ;
- Author
- Pages
- 330-331
- Other elements of collation
- wykr.; Bibliografia (na s.) - 331; Bibliografia (liczba pozycji) - 5; Oznaczenie streszczenia - Abstr.
- Book
- 2nd International Scientific Conference "Chemical Technology and Engineering", Ukraine, Lviv, June 24-28th, 2019 : proceedings, Chemical technology and engineering. Proceedings, 2019, Lviv, Lviv Polytechnic National University
- Keywords in English
- advanced oxidation processes, Fenton, Photo-Fenton, free radicals, printed circuit boards wastewater, organic compounds
- DOI
- DOI:10.23939/cte2019.01.330 Opening in a new tab
- URL
- http://cte.org.ua/2nd-chemical-technology-engineering-2019/proceedings Opening in a new tab
- Language
- eng (en) English
- License
- Score (nominal)
- 0
- Uniform Resource Identifier
- https://cris.pk.edu.pl/info/article/CUT8c55b48dc23f421fb79ae5bcb1061de8/
- URN
urn:pkr-prod:CUT8c55b48dc23f421fb79ae5bcb1061de8
* presented citation count is obtained through Internet information analysis, and it is close to the number calculated by the Publish or PerishOpening in a new tab system.